Project Title: Atmospheric Pressure Chemical Deposition System
Project Description:
The student will help in developing and optimizing an atmospheric
pressure chemical deposition system. Work will be conducted in the
Micro Devices Lab (MDL). A repeatable process for depositing Si02 on
GaAs would have to be developed. The dielectric films would also have
to be characterized using ellipsometry and chemical etching.
Background Information:
The Si02 will be used as a passivation layer for planar Scholtky diodes.
Literature References:
General information about semiconductor processing would be very helpful.
Requirements:
The sponsor requires that interested students meet the following
requirements:
Coursework in solid state devices and/or semiconductor
fabrication techniques would be useful but not essential.
This opportunity is for:
Caltech students only
Research Sponsor
Sponsor: Imran Mehdi
Division: JPL
Mail Code: 168-314
Phone: 354-2001
E-mail: imran@merlin.jpl.nasa.gov